Abstract.
Ta/NiOx/Ni81Fe19/Ta films were prepared by rf reactive and dc magnetron sputtering. The exchange coupling field Hex and the coercivity Hc of NiOx/Ni81Fe19 as a function of the ratio of Ar to O2 during the deposition process were studied. The composition and the chemical states in the interface region of NiOx/NiFe were also investigated using X-ray photoelectron spectroscopy (XPS) and the peak decomposition technique. The results show that the ratio of Ar to O2 has a great effect on the chemical states of nickel in NiOx films. The exchange coupling field Hex and the coercivity Hc of Ta/NiOx/Ni81Fe19/Ta are thus seriously affected. XPS is shown to be a powerful tool for characterizing magnetic films.
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Received: 18 July 2001 / Accepted: 21 December 2001 / Published online: 3 June 2002
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Yu, G., Zhu, F. & Chai, C. X-ray photoelectron spectroscopy study of magnetic films . Appl Phys A 76, 45–47 (2003). https://doi.org/10.1007/s003390201292
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DOI: https://doi.org/10.1007/s003390201292