Abstract
Au films are deposited onto line-patterned substrates, and the dewetting of the line-shaped films is studied. The results show that the line-patterned substrates can clearly lead to both, a decrease and an increase in the resulting particle size and particle spacing when compared to dewetting occurring on a flat substrate. The size and the spacing of the dewetted Au particles scale with the feature size of the line-shaped films in a Rayleigh-like way, but this scaling law ceases when the ratio of line width to film thickness reaches or exceeds a critical value.
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Acknowledgements
The authors are grateful to Dr. Ran Ji from SÜSS MicroTec Lithography GmbH for providing the samples processed by nanoimprint lithography and to Mrs. Manuela Breiter and Mr. Joachim Döll from Ilmenau University of Technology for their help with sample preparation.
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Wang, D., Schaaf, P. Thermal dewetting of thin Au films deposited onto line-patterned substrates. J Mater Sci 47, 1605–1608 (2012). https://doi.org/10.1007/s10853-011-5716-0
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DOI: https://doi.org/10.1007/s10853-011-5716-0