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Gold Nitride: Preparation and Properties

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Abstract

We review the currently known methods of producing gold nitride and report on the influence of electrically isolated substrates on the growth of gold nitride films by reactive ion sputtering (RIS). It is found that isolation of the substrate decreases grain size and increases nitrogen content, the latter attributed to longer nitrogen ion lifetime on the surface of the growing film. The chemical reactivity of gold nitride is compared with that of pure gold films using the adsorption of 1-dodecyl mercaptan (CH3(CH2)11SH) as a model system and it is found that there is no significant difference between gold films and gold nitride in terms of Au–S binding. However, gold nitride nanoparticles are suggested to be worthy of further investigation in terms of their catalytic properties.

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Notes

  1. See complete issue of review articles [3]

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Acknowledgments

We acknowledge EPSRC for support (grant number EP/C006011/1) and also thank Mr. Ross Little for a careful reading of the manuscript.

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Authors and Affiliations

  1. School of Chemical Engineering and Advanced Materials, Newcastle University, Newcastle upon Tyne, NE1 7RU, UK

    L. Šiller, L. Alves, A. C. Brieva & Yu. V. Butenko

  2. Department of Physics, Durham University, Durham, DH1 3LE, UK

    M. R. C. Hunt

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  1. L. Šiller
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  2. L. Alves
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  3. A. C. Brieva
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  4. Yu. V. Butenko
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  5. M. R. C. Hunt
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Correspondence to L. Šiller.

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Šiller, L., Alves, L., Brieva, A.C. et al. Gold Nitride: Preparation and Properties. Top Catal 52, 1604–1610 (2009). https://doi.org/10.1007/s11244-009-9281-6

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