Elsevier

Applied Surface Science

Volume 125, Issue 1, 2 January 1998, Pages 85-92
Applied Surface Science

The deposition of TiO 2 thin films on self-assembly monolayers studied by X-ray photoelectron spectroscopy

https://doi.org/10.1016/S0169-4332(97)00388-7Get rights and content

Abstract

The deposition of TiO 2 films on silanized industrial glass surfaces was investigated by XPS. The results show that mercaptopropyltrimethoxysilane was self-assembled on the industrial glass surface and the terminal groups (-SH) were nearer to the air/silane interface than the silicon atoms. Longer treatment of SAMs with hydrogen peroxide in acetic acid can make the conversion of the terminal groups in the top-most layer into desirable sulfonate groups complete. TiO 2 thin films are successfully absorbed on self-assembly monolayers and titanium oxide with different oxidation states may exist in the thin films as-deposited on the surface of the self-assembly monolayers.

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