Issue 2, 2011

Morphology of poly(methyl methacrylate) and polystyrene blends upon Langmuir–Schaefer deposition

Abstract

Langmuir–Schaefer (LS) deposition of poly(methyl methacrylate) (PMMA) and polystyrene (PS) 10 : 1 and 5 : 1 (mass ratios) blends has been investigated by recording (i) surface pressure isotherms of the Langmuir films at the air/water interface and (ii) atomic force microscopy (AFM) images of the LS films deposited on silica substrates. The results suggest a complete phase separation of PMMA and PS at the air/water interface resulting in a PMMA monolayer on top of which PS islands anchor. However, upon LS dipping, the transfer of PMMA onto the solid substrate is obstructed by the PS domains, which leads to a morphology where a continuous PMMA layer is located at the air-exposed surface. The resulting LS film is thus not a stamped replica of the corresponding floating Langmuir film. The results of this study give new insights for the preparation of bicomponent LS films, especially those containing blends of immiscible polymers.

Graphical abstract: Morphology of poly(methyl methacrylate) and polystyrene blends upon Langmuir–Schaefer deposition

Supplementary files

Article information

Article type
Paper
Submitted
11 May 2010
Accepted
27 Sep 2010
First published
11 Nov 2010

Soft Matter, 2011,7, 743-748

Morphology of poly(methyl methacrylate) and polystyrene blends upon Langmuir–Schaefer deposition

M. Pohjakallio, T. Aho, K. Kontturi and E. Kontturi, Soft Matter, 2011, 7, 743 DOI: 10.1039/C0SM00360C

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements