Near-band-gap photoluminescence of Si-Ge alloys

J. Weber and M. I. Alonso
Phys. Rev. B 40, 5683 – Published 15 September 1989
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Abstract

The low-temperature near-band-gap photoluminescence of Si1xGex is studied over the whole composition range 0≤x≤1. We identify free- and bound-exciton processes and determine the properties of momentum-conserving phonons. From our results we determine the low-temperature band gap of the alloys. Analytical expressions are derived for the X and L bands: EgxX(x) =1.155-0.43x+0.206x2 eV; EgxL(x)=2.010-1.270x eV. The intensity and the linewidth of the various excitonic transitions are found to depend only on the statistical alloy fluctuations. No preferential clustering of Si and Ge atoms is detected.

  • Received 6 March 1989

DOI:https://doi.org/10.1103/PhysRevB.40.5683

©1989 American Physical Society

Authors & Affiliations

J. Weber and M. I. Alonso

  • Max-Planck-Institut für Festkörperforschung, Heisenbergstrasse 1, Postfach 80 06 65, D-7000 Stuttgart 80, Federal Republic of Germany

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Issue

Vol. 40, Iss. 8 — 15 September 1989

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