Electron transport at metal-semiconductor interfaces: General theory

R. T. Tung
Phys. Rev. B 45, 13509 – Published 15 June 1992
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Abstract

A dipole-layer approach is presented, which leads to analytic solutions to the potential and the electronic transport at metal-semiconductor interfaces with arbitrary Schottky-barrier-height profiles. The presence of inhomogeneities in the Schottky-barrier height is shown to lead to a coherent explanation of many anomalies in the experimental results. These results suggest that the formation mechanism of the Schottky barrier is locally nonuniform at common, polycrystalline, metal-semiconductor interfaces.

  • Received 29 January 1992

DOI:https://doi.org/10.1103/PhysRevB.45.13509

©1992 American Physical Society

Authors & Affiliations

R. T. Tung

  • AT&T Bell Laboratories, Murray Hill, New Jersey 07974

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Issue

Vol. 45, Iss. 23 — 15 June 1992

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