Electronic structure and optical properties of silicon nanowires: A study using x-ray excited optical luminescence and x-ray emission spectroscopy

T. K. Sham, S. J. Naftel, P.-S. G. Kim, R. Sammynaiken, Y. H. Tang, I. Coulthard, A. Moewes, J. W. Freeland, Y.-F. Hu, and S. T. Lee
Phys. Rev. B 70, 045313 – Published 20 July 2004

Abstract

We report a soft x-ray excited optical luminescence (XEOL) and x-ray emission spectroscopy (XES) study of silicon nanowires (SiNW) with excitations at the silicon K and L3,2 edge, respectively. It is found that the XEOL of SiNW exhibits several luminescence bands at 460, 530, and 630nm. These luminescence bands are broad and are sensitive to the Si1s excitation channel (Si versus SiO2 whiteline). These chemical- and morphology-dependent luminescences are attributable to the emission from the encapsulating silicon oxide, the quantum-confined silicon crystallites of various sizes embedded in the oxide layer, and the silicon-silicon oxide interface. XES clearly shows the presence of a relatively thick oxide layer encapsulating the silicon nanowire and the densities of states tailing across the Fermi level. The implications of these findings to the electronic and optical properties of silicon nanowires are discussed.

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  • Received 19 November 2003

DOI:https://doi.org/10.1103/PhysRevB.70.045313

©2004 American Physical Society

Authors & Affiliations

T. K. Sham, S. J. Naftel, P.-S. G. Kim, R. Sammynaiken, and Y. H. Tang

  • Department of Chemistry, University of Western Ontario, London, Canada N6A 3B7

I. Coulthard

  • The Canadian Light Source, University of Saskatchewan, Saskatoon, Canada

A. Moewes

  • Department of Physics, University of Saskatchewan, Saskatoon, Canada

J. W. Freeland

  • Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439, USA

Y.-F. Hu

  • Canadian Synchrotron Radiation Facility, Synchrotron Radiation Center, University of Wisconsin, Madison, Wisconsin 53589, USA

S. T. Lee

  • Center of Super-Diamond and Advanced Films (COSDAF) and Department of Physics and Materials, City University of Hong Kong, Hong Kong SAR, China

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Vol. 70, Iss. 4 — 15 July 2004

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