External field control of donor electron exchange at the SiSiO2 interface

M. J. Calderón, Belita Koiller, and S. Das Sarma
Phys. Rev. B 75, 125311 – Published 13 March 2007

Abstract

We analyze several important issues for the single- and two-qubit operations in Si quantum computer architectures involving P donors close to a SiO2 interface. For a single donor, we investigate the donor-bound electron manipulation (i.e., one-qubit operation) between the donor and the interface by electric and magnetic fields. We establish conditions to keep a donor-bound state at the interface in the absence of local surface gates and estimate the maximum planar density of donors allowed to avoid the formation of a two-dimensional electron gas at the interface. We also calculate the times involved in single electron shuttling between the donor and the interface. For a donor pair we find that, under certain conditions, the exchange coupling (i.e., two-qubit operation) between the respective electron pair at the interface may be of the same order of magnitude as the coupling in GaAs-based two-electron double quantum dots, where coherent spin manipulation and control have recently been demonstrated (for example, for donors 10nm below the interface and 40nm apart, J104meV), opening the perspective for similar experiments to be performed in Si.

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  • Received 3 December 2006

DOI:https://doi.org/10.1103/PhysRevB.75.125311

©2007 American Physical Society

Authors & Affiliations

M. J. Calderón1, Belita Koiller2, and S. Das Sarma1

  • 1Condensed Matter Theory Center, Department of Physics, University of Maryland, College Park, Maryland 20742-4111, USA
  • 2Instituto de Física, Universidade Federal do Rio de Janeiro, Caixa Postal 68528, 21941-972 Rio de Janeiro, Brazil

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Vol. 75, Iss. 12 — 15 March 2007

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