Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
Mold Surface Treatment for Imprint Lithography
Yoshihiko HiraiSatoshi YoshidaAkio OkamotoYoshio TanakaMasataka EndoSigeo IrieHideo NakagawaMasaru Sasago
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2001 Volume 14 Issue 3 Pages 457-462

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Abstract

An adhesion problem is one of the most significant problems in nano imprint lithography. A mold should be released from a resist polymer without adhesion. We investigate a surface coating of a mold by fluorine polymers to reduce surface tension and making it easy to release the mold from the resist polymer. Evaporation of a FEP polymer in vacuum atmosphere and surface treatment for a mold by a silane-coupling agent with perfluoropolyether (PFPE-S) is examined. The releasing characteristics of molds are quantitatively evaluated by a contact angle for a water droplet. Durability of the fluorine polymers is also evaluated by continuous imprinting and the abrasion examinations.

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© The Technical Association of Photopolymers, Japan
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